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Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt

Lingua IngleseInglese
Libro In brossura
Libro Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt Stanley D Crozier
Codice Libristo: 08143237
Casa editrice Biblioscholar, ottobre 2012
The goal of this work is to develop unique holograms on a semiconductor-metal thin films to characte... Descrizione completa
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The goal of this work is to develop unique holograms on a semiconductor-metal thin films to characterize as potential metamaterials. This is achievable by developing a fabrication recipe to include exposure methods, exposure dosages, and material development. This study developed an interference lithography capability at AFIT for the first time with period resolution below 230nm. It also identified initial acceptable photoresist materials and exposure dosages, and a path to follow to optimize this process.

Informazioni sul libro

Titolo completo Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt
Autore Stanley D Crozier
Lingua Inglese
Rilegatura Libro - In brossura
Data di pubblicazione 2012
Numero di pagine 96
EAN 9781249829553
ISBN 9781249829553
Codice Libristo 08143237
Casa editrice Biblioscholar
Peso 186
Dimensioni 189 x 246 x 5

Categorie

Società e scienze sociali > Educazione
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